Sunday, July 13, 2008

THIN FILM GROWTH PROCESS

Any Thin-film deposition process involves three main steps:
1. Production of the appropriate atomic, molecular, or ionic species.
2. Transport of these species to the substrate through a medium.
3. Condensation on the substrate, either directly or via a chemical and/or electrochemical reaction, to form a solid deposit.

Formation of a thin film takes place via nucleation and growth processes. The general picture of the step-by-step growth process emerging from the various experimental and theoretical studies can be presented as follows:

1. The unit species, on impacting the substrate, lose their velocity component normal to the substrate (provided the incident energy is not too high) and are physically adsorbed on the substrate surface.
2. The adsorbed species are not in thermal equilibrium with the substrate initially and move over the substrate surface. In this process they interact among themselves, forming bigger clusters.
3. The clusters or the nuclei, as they are called, are thermodynamically unstable and may tend to desorb in time, depending on the deposition parameters. If the deposition parameters are such that a cluster collides with other adsorbed species before getting desorbed, it starts growing in size. After reaching a certain critical size, the cluster becomes thermodynamically stable and the nucleation barrier is said to have been overcome. This step involving the formation of stable, chemisorbed, critical-sized nuclei is called the nucleation stage.
4. The critical nuclei grow in number as well as in size until a saturation nucleation density is reached. The nucleation density and the average nucleus size depend on a number of parameters such as the energy of the impinging species, the rate of impingement, the activation energies of adsorption, desorption, thermal diffusion, and the temperature, topography, and chemical nature of the substrate. A nucleus can grow both parallel to the substrate by surface diffusion of the adsorbed species, and perpendicular to it by direct impingement of the incident species.
In general, however, the rate of lateral growth at this stage is much higher than the perpendicular growth. The grown nuclei are called islands.
5. The next stage in the process of film formation is the coalescence stage, in which the small islands start coalescing with each other in an attempt to reduce the substrate surface area. This tendency to form bigger islands is termed agglomeration and is enhanced by increasing the surface mobility of the adsorbed species, by, for example, increasing the substrate temperature. In some cases, formation of new nuclei may occur on areas freshly exposed as a consequence of coalescence.
6. Larger islands grow together, leaving channels and holes of uncovered substrate. The structure of the films at this stage changes from discontinuous island type to porous network type. Filling of the channels and holes forms a completely continuous film.

The growth process thus may be summarized as consisting of a statistical process of nucleation, surface-diffusion controlled growth of the three-dimensional nuclei, and formation of a network structure and its subsequent filling to give a continuous film. Depending on the thermodynamic parameters of the deposit and the substrate surface, the initial nucleation and growth stages may be described as
(a) Island type, called Volmer-Weber type,
(b) Layer type, called Frank-van der Merwe type, and
(c) Mixed type, called Stranski-Krastanov type.

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